[Full Picture] Pixelated source mask optimization for process robustness in optical lithography

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Summary Analysis Research

1. 本文介绍了一种基于像素化源掩模优化的光刻工艺鲁棒性方法。

2. 文中提到了多种反演光刻技术，如基于水平集的反演光刻、梯度法源掩模优化等。

3. 文章还涉及到光刻工艺中的照明优化和周期图案最大工艺窗口等问题。

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Background information on the topic Current trends and developments Key players and stakeholders involved Relevant laws and regulations Potential challenges and opportunities Future outlook and implications