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Article summary:

1. The demand for increased processing capability has led to the scaling of MOS transistors dimensions.

2. Short channel effects (SCEs) can degrade electrical characteristics when devices are scaled to extreme levels.

3. Technologies such as Silicon-on-Insulator (SOI) and multigate devices have been developed to minimize SCEs.

Article analysis:

The article is generally reliable and trustworthy, as it provides a clear overview of the issue at hand and cites relevant sources for further reading. The article does not appear to be biased or one-sided, as it presents both sides of the argument in an even-handed manner. It also does not contain any promotional content or partiality, nor does it present any risks without noting them.

However, there are some points that could be improved upon in terms of trustworthiness and reliability. For example, the article does not provide any evidence for the claims made, nor does it explore any counterarguments or missing points of consideration. Additionally, while both sides of the argument are presented equally, they are not explored in equal depth; more detail could be provided on each side in order to make the article more comprehensive and balanced.