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Subwavelength structured silicon waveguides and photonic devices
Source: webvpn.njust.edu.cn
Article summary:
1. Subwavelength structured waveguides are fundamental elements in integrated optics and have recently seen significant growth due to their compatibility with the CMOS fabrication process.
2. Structural design and refractive index engineering are important for the realization of novel and high-performance devices, such as couplers, polarization handling devices, and mode multiplexers.
3. Advanced fabrication capabilities have enabled a boom in subwavelength research, extending to two-dimensional (2D) index control in waveguides for new functional devices or improved device performances.
Article analysis:
The article is generally reliable and trustworthy, providing an overview of subwavelength structured waveguides and photonic devices. The article is well-structured and provides a comprehensive review of the principles behind subwavelength structures as well as recent developments in device research. The article also provides an overview of the fabrication techniques used to create these structures, such as 193-nm deep ultraviolet (DUV) lithography and electron beam lithography (EBL).
The article does not appear to be biased or one-sided; it presents both sides equally by discussing both the advantages and disadvantages of different fabrication techniques. It also does not appear to contain any promotional content or partiality towards any particular technique or technology. Furthermore, the article does not make any unsupported claims; all claims are backed up with evidence from relevant sources.
The only potential issue with the article is that it does not explore any counterarguments or missing points of consideration regarding subwavelength structures or photonic devices. However, this is likely due to the fact that this is a review article rather than a research paper; thus, it may be outside the scope of this particular piece to explore counterarguments or missing points of consideration in detail.